Institute of Fluid Science,
Sendai, Japan 980-8577
Joined NEC in 1981 after graduating in Instrumentation Engineering from Keio University. Worked on the research and development of ultra-precise plasma etching processes for ULSI devices. Promoted to Principal Researcher in Microelectronics Laboratory, R&D Group NEC Corporation. Obtained a Ph.D. in Instrumentation Engineering from Keio University in 1992. Since July 2000, he has been a full professor at Tohoku University, where he is currently Director of the Innovative Energy Research Center at the Institute of Fluid Science (IFS) Tohoku University. He is also a Principal Investigator (PI) at Advanced Institute of Materials Research (AIMR) Tohoku university, deputy director of Material Solutions Center (MaSC) Tohoku university, and also joint Chair Professor of Taiwan National Chiao Tung University. His significant scientific achievements earned him Ichimura Award (2008) in the New Technology Development Foundation, Prizes for Science and Technology (2009); The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology, and Plasma Prize (2010) in American Vacuum Society. Additionally, he has been elected as a “Distinguished Professor” of Tohoku University, a “Fellow” of the Japan Society of Applied Physics since 2008, a “Fellow” of American Vacuum Society since 2009 and a “senior member” of IEEE since 2012.